cff-version: 1.2.0
abstract: "<p>Dataset to accompany the publication of a manuscript on Area-selective Atomic Layer Deposition through Selective Passivation of SiO<sub>2</sub> with a SF<sub>6</sub>/H<sub>2</sub> Plasma. The data contains ellipsometry data of the substrates during plasma exposures and nucleation curves of TiO<sub>2</sub> deposition on HfO<sub>2</sub>, ZnO, Al<sub>2</sub>O<sub>3</sub> and SiO<sub>2</sub>; Reflection absorption infrared spectra on SiO<sub>2</sub> and Al<sub>2</sub>O<sub>3 </sub>for different plasma and reactant exposures; and x-ray photoelectron spectra of SiO<sub>2</sub> after plasma exposure. Further details can be found in README.txt and the manuscript.</p><p><br></p>"
authors:
  - family-names: Bolkenbaas
    given-names: Olaf
    orcid: "https://orcid.org/0000-0001-5817-9312"
  - family-names: Merkx
    given-names: Marc
    orcid: "https://orcid.org/0000-0002-3886-0220"
  - family-names: Chittock
    given-names: Nicholas
  - family-names: Tezsevin
    given-names: Ilker
    orcid: "https://orcid.org/0000-0001-5648-3943"
  - family-names: Kessels
    given-names: Wilhelmus M. M.
    orcid: "https://orcid.org/0000-0002-7630-8226"
  - family-names: Sandoval
    given-names: Tania E.
    orcid: "https://orcid.org/0000-0001-9418-5031"
  - family-names: Mackus
    given-names: Adrie
    orcid: "https://orcid.org/0000-0001-6944-9867"
title: "Data underlying the publication: Area-selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma"
keywords:
version: 1
identifiers:
  - type: doi
    value: 10.4121/e96c7616-f34a-4e39-a3ea-e78db832f8b4.v1
license: CC BY-NC-ND 4.0
date-released: 2025-07-02